1

Low-temperature dopant activation technology using elevated Ge-S/D structure

Année:
2004
Langue:
english
Fichier:
PDF, 266 KB
english, 2004
6

Nucleation of Islands During Epitaxial Growth: Influence of a Second Species

Année:
1998
Langue:
english
Fichier:
PDF, 609 KB
english, 1998
7

Dual Work Function CMOS Gate Technology Based on Metal Interdiffusion

Année:
2001
Langue:
english
Fichier:
PDF, 114 KB
english, 2001